User:Ashvinee singh
Call for participation in WikiConference India 2011 is now open. Please submit your proposal here. Last date for submission is August 30, 2011.
Electroplating From Wikipedia, the free encyclopedia Jump to: navigation, search
Call for participation in WikiConference India 2011 is now open. Please submit your proposal here. Last date for submission is August 30, 2011.
Crystallinity From Wikipedia, the free encyclopedia
(Redirected from Crystalline)
Jump to: navigation, search
This article does not cite any references or sources. Please help improve this article by adding citations to reliable sources. Unsourced material may be challenged and removed. (December 2009)
"Crystalline" redirects here. It is not to be confused with Crystallin. For the Björk song, see Crystalline (song). Crystallinity refers to the degree of structural order in a solid. In a crystal, the atoms or molecules are arranged in a regular, periodic manner. The degree of crystallinity has a big influence on hardness, density, transparency and diffusion. In a gas, the relative positions of the atoms or molecules are completely random. Amorphous materials, such as liquids and glasses, represent an intermediate case, having order over short distances (a few atomic or molecular spacings) but not over longer distances.
Many materials (such as glass-ceramics and some polymers), can be prepared in such a way as to produce a mixture of crystalline and amorphous regions. In such cases, crystallinity is usually specified as a percentage of the volume of the material that is crystalline. Even within materials that are completely crystalline, however, the degree of structural perfection can vary. For instance, most metallic alloys are crystalline, but they usually comprise many independent crystalline regions (grains or crystallites) in various orientations separated by grain boundaries; furthermore, they contain other defects (notably dislocations) that reduce the degree of structural perfection. The most highly perfect crystals are silicon boules produced for semiconductor electronics; these are large single crystals (so they have no grain boundaries), are nearly free of dislocations, and have precisely controlled concentrations of defect atoms.
Crystallinity can be measured using x-ray diffraction, but calorimetric techniques are also commonly used.
[edit] Rocks crystallinity Geologists describe four qualitative levels of crystallinity:
holocrystalline rocks are completely crystalline; hypocrystalline rocks are partially crystalline, with crystals embedded in an amorphous or glassy matrix; hypohyaline rocks are partially glassy; holohyaline rocks (such as obsidian) are completely glassy.
Retrieved from "http://en.wikipedia.org/wiki/Crystallinity" View page ratingsRate this pageRate this page Page ratings What's this?Current average ratings.Trustworthy
4.02 ratingsObjective
4.02 ratingsComplete
Contains key information, but with gaps3.52 ratingsWell-written
4.52 ratingsI am highly knowledgeable about this topic (optional) I have a relevant college/university degreeIt is part of my professionIt is a deep personal passionThe source of my knowledge is not listed here I would like to help improve Wikipedia, send me an e-mail (optional) We will send you a confirmation e-mail. We will not share your address with anyone. (Privacy policy)Submit ratings
Saved successfullyYour ratings have not been submitted yetYour ratings have expired
Please reevaluate this page and submit new ratings. An error has occured. Please try again later.Thanks! Your ratings have been saved. Please take a moment to complete a short survey. Start survey Maybe later Thanks! Your ratings have been saved. Do you want to create an account? An account will help you track your edits, get involved in discussions, and be a part of the community. Create an account orLog in Maybe later Thanks! Your ratings have been saved. Did you know that you can edit this page? Edit this page Maybe later Categories: Crystals | Physical quantities Hidden categories: Articles lacking sources from December 2009 | All articles lacking sources Personal tools Ashvinee singh My talk My preferences My watchlist My contributions Log out Namespaces Article Discussion VariantsViews Read Edit View history Watch ActionsSearch
Navigation
Main page Contents Featured content Current events Random article Donate to Wikipedia Interaction Help About Wikipedia Community portal Recent changes Contact Wikipedia Toolbox What links here Related changes Upload file Special pages Permanent link Cite this page Rate this page Print/export Create a book Download as PDF Printable version Languages Français Italiano This page was last modified on 27 June 2011 at 01:02.
Text is available under the Creative Commons Attribution-ShareAlike License; additional terms may apply. See Terms of use for details. Wikipedia® is a registered trademark of the Wikimedia Foundation, Inc., a non-profit organization.
Contact us Privacy policy About Wikipedia Disclaimers Mobile View Not to be confused with electrophoreticBold text deposition.
Copper electroplating machine for layering PCBsElectroplating is a plating process in which metal ions in a solution are moved by an electric field to coat an electrode. The process uses electrical current to reduce cations of a desired material from a solution and coat a conductive object with a thin layer of the material, such as a metal. Electroplating is primarily used for depositing a layer of material to bestow a desired property (e.g., abrasion and wear resistance, corrosion protection, lubricity, aesthetic qualities, etc.) to a surface that otherwise lacks that property. Another application uses electroplating to build up thickness on undersized parts.
The process used in electroplating is called electrodeposition. It is analogous to a galvanic cell acting in reverse. The part to be plated is the cathode of the circuit. In one technique, the anode is made of the metal to be plated on the part. Both components are immersed in a solution called an electrolyte containing one or more dissolved metal salts as well as other ions that permit the flow of electricity. A power supply supplies a direct current to the anode, oxidizing the metal atoms that comprise it and allowing them to dissolve in the solution. At the cathode, the dissolved metal ions in the electrolyte solution are reduced at the interface between the solution and the cathode, such that they "plate out" onto the cathode. The rate at which the anode is dissolved is equal to the rate at which the cathode is plated, vis-a-vis the current flowing through the circuit. In this manner, the ions in the electrolyte bath are continuously replenished by the anode.[1]
Other electroplating processes may use a non-consumable anode such as lead. In these techniques, ions of the metal to be plated must be periodically replenished in the bath as they are drawn out of the solution.[2]
Contents [hide] 1 Process 1.1 Strike 1.2 Brush electroplating 1.3 Electroless deposition 1.4 Cleanliness 2 Effects 3 History 4 Hull cell 5 References
[edit] Process
Electroplating of a metal (Me) with copper in a copper sulfate bathThe anode and cathode in the electroplating cell are both connected to an external supply of direct current — a battery or, more commonly, a rectifier. The anode is connected to the positive terminal of the supply, and the cathode (article to be plated) is connected to the negative terminal. When the external power supply is switched on, the metal at the anode is oxidized from the zero valence state to form cations with a positive charge. These cations associate with the anions in the solution. The cations are reduced at the cathode to deposit in the metallic, zero valence state. For example, in an acid solution, copper is oxidized at the anode to Cu2+ by losing two electrons. The Cu2+ associates with the anion SO42- in the solution to form copper sulfate. At the cathode, the Cu2+ is reduced to metallic copper by gaining two electrons. The result is the effective transfer of copper from the anode source to a plate covering the cathode.
The plating is most commonly a single metallic element, not an alloy. However, some alloys can be electrodeposited, notably brass and solder.
Many plating baths include cyanides of other metals (e.g., potassium cyanide) in addition to cyanides of the metal to be deposited. These free cyanides facilitate anode corrosion, help to maintain a constant metal ion level and contribute to conductivity. Additionally, non-metal chemicals such as carbonates and phosphates may be added to increase conductivity.
When plating is not desired on certain areas of the substrate, stop-offs are applied to prevent the bath from coming in contact with the substrate. Typical stop-offs include tape, foil, lacquers, and waxes.[3]
[edit] Strike Initially, a special plating deposit called a "strike" or "flash" may be used to form a very thin (typically less than 0.1 micrometer thick) plating with high quality and good adherence to the substrate. This serves as a foundation for subsequent plating processes. A strike uses a high current density and a bath with a low ion concentration. The process is slow, so more efficient plating processes are used once the desired strike thickness is obtained.
The striking method is also used in combination with the plating of different metals. If it is desirable to plate one type of deposit onto a metal to improve corrosion resistance but this metal has inherently poor adhesion to the substrate, a strike can be first deposited that is compatible with both. One example of this situation is the poor adhesion of electrolytic nickel on zinc alloys, in which case a copper strike is used, which has good adherence to both.[2]
[edit] Brush electroplating A closely-related process is brush electroplating, in which localized areas or entire items are plated using a brush saturated with plating solution. The brush, typically a stainless steel body wrapped with a cloth material that both holds the plating solution and prevents direct contact with the item being plated, is connected to the positive side of a low voltage direct-current power source, and the item to be plated connected to the negative. The operator dips the brush in plating solution then applies it to the item, moving the brush continually to get an even distribution of the plating material. Brush electroplating has several advantages over tank plating, including portability, ability to plate items that for some reason cannot be tank plated (one application was the plating of portions of very large decorative support columns in a building restoration), low or no masking requirements, and comparatively low plating solution volume requirements. Disadvantages compared to tank plating can include greater operator involvement (tank plating can frequently be done with minimal attention), and inability to achieve as great a plate thickness.
[edit] Electroless deposition Usually an electrolytic cell (consisting of two electrodes, electrolyte, and external source of current) is used for electrodeposition. In contrast, an electroless deposition process uses only one electrode and no external source of electric current. However, the solution for the electroless process needs to contain a reducing agent so that the electrode reaction has the form:
In principle any water-based reducer can be used although the redox potential of the reducer half-cell must be high enough to overcome the energy barriers inherent in liquid chemistry. Electroless nickel plating uses hypophosphite as the reducer while plating of other metals like silver, gold and copper typically use low molecular weight aldehydes.
A major benefit of this approach over electroplating is that power sources and plating baths are not needed, reducing the cost of production. The technique can also plate diverse shapes and types of surface. The downside is that the plating process is usually slower and cannot create such thick plates of metal. As a consequence of these characteristics, electroless deposition is quite common in the decorative arts.
[edit] Cleanliness Cleanliness is essential to successful electroplating, since molecular layers of oil can prevent adhesion of the coating. ASTM B322 is a standard guide for cleaning metals prior to electroplating. Cleaning processes include solvent cleaning, hot alkaline detergent cleaning, electro-cleaning, and acid treatment etc. The most common industrial test for cleanliness is the waterbreak test, in which the surface is thoroughly rinsed and held vertical. Hydrophobic contaminants such as oils cause the water to bead and break up, allowing the water to drain rapidly. Perfectly clean metal surfaces are hydrophilic and will retain an unbroken sheet of water that does not bead up or drain off. ASTM F22 describes a version of this test. This test does not detect hydrophilic contaminants, but the electroplating process can displace these easily since the solutions are water-based. Surfactants such as soap reduce the sensitivity of the test and must be thoroughly rinsed off.
[edit] Effects Electroplating changes the chemical, physical, and mechanical properties of the workpiece. An example of a chemical change is when nickel plating improves corrosion resistance. An example of a physical change is a change in the outward appearance. An example of a mechanical change is a change in tensile strength or surface hardness which is a required attribute in tooling industry.[4]
[edit] History
Nickel platingAlthough it is not confirmed, the Parthian Battery may have been the first system used for electroplating.
Modern electrochemistry was invented by Italian chemist Luigi V. Brugnatelli in 1805. Brugnatelli used his colleague Alessandro Volta's invention of five years earlier, the voltaic pile, to facilitate the first electrodeposition. Brugnatelli's inventions were suppressed by the French Academy of Sciences and did not become used in general industry for the following thirty years.
By 1839, scientists in Britain and Russia had independently devised metal deposition processes similar to Brugnatelli's for the copper electroplating of printing press plates.
Boris Jacobi developed electroplating, electrotyping and galvanoplastic sculpture in RussiaBoris Jacobi in Russia not only rediscovered galvanoplastics, but developed electrotyping and galvanoplastic sculpture. Galvanoplactics quickly came into fashion in Russia, with such people as inventor Peter Bagration, scientist Heinrich Lenz and science fiction author Vladimir Odoyevsky all contributing to further development of the technology. Among the most notorious cases of electroplating usage in mid-19th century Russia were gigantic galvanoplastic sculptures of St. Isaac's Cathedral in Saint Petersburg and gold-electroplated dome of the Cathedral of Christ the Saviour in Moscow, the tallest Orthodox church in the world.[5]
Galvanoplastic sculpture on St. Isaac's Cathedral in Saint Petersburg.Soon after, John Wright of Birmingham, England discovered that potassium cyanide was a suitable electrolyte for gold and silver electroplating. Wright's associates, George Elkington and Henry Elkington were awarded the first patents for electroplating in 1840. These two then founded the electroplating industry in Birmingham from where it spread around the world.
The Norddeutsche Affinerie in Hamburg was the first modern electroplating plant starting its production in 1876.[6]
As the science of electrochemistry grew, its relationship to the electroplating process became understood and other types of non-decorative metal electroplating processes were developed. Commercial electroplating of nickel, brass, tin, and zinc were developed by the 1850s. Electroplating baths and equipment based on the patents of the Elkingtons were scaled up to accommodate the plating of numerous large scale objects and for specific manufacturing and engineering applications.
The plating industry received a big boost from the advent of the development of electric generators in the late 19th century. With the higher currents, available metal machine components, hardware, and automotive parts requiring corrosion protection and enhanced wear properties, along with better appearance, could be processed in bulk.
The two World Wars and the growing aviation industry gave impetus to further developments and refinements including such processes as hard chromium plating, bronze alloy plating, sulfamate nickel plating, along with numerous other plating processes. Plating equipment evolved from manually operated tar-lined wooden tanks to automated equipment, capable of processing thousands of kilograms per hour of parts.
One of the American physicist Richard Feynman's first projects was to develop technology for electroplating metal onto plastic. Feynman developed the original idea of his friend into a successful invention, allowing his employer (and friend) to keep commercial promises he had made but could not have fulfilled otherwise.[7]
[edit] Hull cell
A zinc solution tested in a hull cellThe Hull cell is a type of test cell used to qualitatively check the condition of a electroplating bath. It allows for optimization for current density range, optimization of additive concentration, recognition of impurity effects and indication of macro-throwing power capability.[8] The Hull cell replicates the plating bath on a lab scale. It is filled with a sample of the plating solution, an appropriate anode which is connected to a rectifier. The "work" is replaced with a hull cell test panel that will be plated to show the "health" of the bath.
The Hull cell is a trapezoidal container that holds 267 ml of solution. This shape allows one to place the test panel on an angle to the anode. As a result, the deposit is plated at different current densities which can be measured with a hull cell ruler. The solution volume allows for a quantitative optimization of additive concentration: 1 gram addition to 267 mL is equivalent to 0.5 oz/gal in the plating tank.[9]
[edit] References ^ Dufour, IX-1. ^ a b Dufour, IX-2. ^ Dufour, IX-3. ^ Todd, pp. 454–458. ^ The history of galvanotechnology in Russia (Russian) ^ Stelter, M.; Bombach, H. (2004). "Process Optimization in Copper Electrorefining". Advanced Engineering Materials 6: 558. doi:10.1002/adem.200400403. ^ Richard Feynman, Surely You're Joking, Mr. Feynman! (1985), in chap. 6: "The Chief Research Chemist of the Metaplast Corporation" [1] ^ Metal Finishing: Guidebook and Directory Issue 98, 95, 1998, p. 588 . ^ Hull Cell 101 Retrieved from "http://en.wikipedia.org/wiki/Electroplating" View page ratingsRate this pageRate this page Page ratings What's this?Current average ratings.Trustworthy
Objective
Complete
Well-written
I am highly knowledgeable about this topic (optional) I have a relevant college/university degreeIt is part of my professionIt is a deep personal passionThe source of my knowledge is not listed here I would like to help improve Wikipedia, send me an e-mail (optional) We will send you a confirmation e-mail. We will not share your address with anyone. (Privacy policy)Submit ratings
Saved successfullyYour ratings have not been submitted yetYour ratings have expired
Please reevaluate this page and submit new ratings. An error has occured. Please try again later.Thanks! Your ratings have been saved. Please take a moment to complete a short survey. Start survey Maybe later Thanks! Your ratings have been saved. Do you want to create an account? An account will help you track your edits, get involved in discussions, and be a part of the community. Create an account orLog in Maybe later Thanks! Your ratings have been saved. Did you know that you can edit this page? Edit this page Maybe later Categories: Metal plating Personal tools Ashvinee singh My talk My preferences My watchlist My contributions Log out Namespaces Article Discussion VariantsViews Read Edit View history Watch ActionsSearch
Navigation
Main page Contents Featured content Current events Random article Donate to Wikipedia Interaction Help About Wikipedia Community portal Recent changes Contact Wikipedia Toolbox What links here Related changes Upload file Special pages Permanent link Cite this page Rate this page Print/export Create a book Download as PDF Printable version Languages Deutsch Español Français Italiano Nederlands Português Русский Українська 中文 This page was last modified on 28 July 2011 at 08:16.
Text is available under the Creative Commons Attribution-ShareAlike License; additional terms may apply. See Terms of use for details. Wikipedia® is a registered trademark of the Wikimedia Foundation, Inc., a non-profit organization.
Contact us Privacy policy About Wikipedia Disclaimers Mobile View