Remote plasma
A remote plasma (also downstream plasma or afterglow plasma) is a plasma processing method in which the plasma and material interaction occurs at a location remote from the plasma in the plasma afterglow.[1][2]
See also
[edit]- Chemical vapor deposition
- Corona treatment
- Physical vapor deposition
- Plasma activation
- Plasma chemistry
- Plasma cleaning
- Plasma-activated bonding
- Reactive ion etching
References
[edit]- ^ Tommi Kääriäinen; David Cameron; Marja-Leena Kääriäinen; Arthur Sherman (17 May 2013). Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications. Wiley. pp. 21–. ISBN 978-1-118-74742-1.
- ^ Alexander Fridman (5 May 2008). Plasma Chemistry. Cambridge University Press. pp. 532–. ISBN 978-1-139-47173-2.
 | This article about materials science is a stub. You can help Wikipedia by expanding it. |