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Chemical Vapor Deposition (journal)

From Wikipedia, the free encyclopedia
Chemical Vapor Deposition
DisciplineMaterials science
LanguageEnglish
Edited byPeter Gregory
Publication details
History1995–2015
Publisher
FrequencyMonthly
1.333 (2016)
Standard abbreviations
ISO 4Chem. Vap. Depos.
Indexing
CODENCVDEFX
ISSN0948-1907 (print)
1521-3862 (web)
LCCNsn96038108
OCLC no.865512213
Links

Chemical Vapor Deposition was a monthly peer-reviewed scientific journal covering materials science. It was established in 1995 and ceased independent publication in 2015, when it became a section of Advanced Materials Interfaces. The journal was published by Wiley-VCH and the editor-in-chief was Peter Gregory.

Abstracting and indexing

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The journal was abstracted and indexed in:

According to the Journal Citation Reports, the journal's final (2016) impact factor was 1.333.[6]

References

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  1. ^ "CAS Source Index". Chemical Abstracts Service. American Chemical Society. Archived from the original on 2016-05-15. Retrieved 2017-09-03.
  2. ^ "Content/Database Overview - Compendex Source List". Engineering Village. Elsevier. Retrieved 2017-09-03.
  3. ^ a b c "Master Journal List". Intellectual Property & Science. Clarivate Analytics. Archived from the original on 2017-09-26. Retrieved 2017-09-03.
  4. ^ "Inspec list of journals" (PDF). Inspec. Institution of Engineering and Technology. Retrieved 2017-09-03.
  5. ^ "Source details: Chemical Vapor Deposition". Scopus preview. Elsevier. Retrieved 2017-09-03.
  6. ^ "Chemical Vapor Deposition". 2016 Journal Citation Reports. Web of Science (Science ed.). Clarivate Analytics. 2017.