File:Tetrahedral amorphous carbon thin film.jpg
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Deutsch: Tetraedrischgebundener amorpher Kohlenstofffilm, hergestellt durch Ionenstrahldeposition an der Universitaet Goettingen. Die blaue Region hat eine Dicke von 80nm, die beige eine Dicke von 40nm. Ueber das Siliziumsubstrat wurde ein abschattender Draht zur Erleichterung der Schichtdickenmessung gespannt. Die helle Aura um die Kohlenstoffschicht ist durch Sputterreinigung des Siliziums mit 1keV Argonionen verursacht. English: Tetrahedral amorphous carbon thin film grown by ion beam deposition at University of Goettingen, Germany. The two colors result from interference at the 80nm (blue) and 40nm (tan) region. The trench was caused by a wire across the substrate to facilitate the thickness measurement. The light aura around the carbon film is the result of a 1keV Argon ion sputter cleaning treatment prior to deposition. |
| Date | |
| Source | Own work |
| Author | Daniel Schwen |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 13:05, 22 May 2007 | | 1,600 × 1,309 (149 KB) | Dschwen | {{Information |Description={{de|Tetraedrischgebundener amorpher Kohlenstofffilm. Die blaue Region hat eine Dicke von 40nm, die beige eine Dicke von 80nm. Ueber das Siliziumsubstrat wurde ein abschattender Draht zur Erleichterung der Schichtdickenmessung g |
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