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English: Some double patterning practices stitch together two separately printed features to form a new single feature.[1][2][3]
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Author Guiding light

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References

  1. S-Min Kim et al., Proc. SPIE 6520, 65200H (2007).
  2. Y. Kohira et al., Proc. SPIE 9053, 90530T (2014).
  3. Application-Specific Lithography: Sense Amplifier and Sub-Wordline Driver Metal Patterning in DRAM

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10 December 2023

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current08:42, 10 December 2023Thumbnail for version as of 08:42, 10 December 2023865 × 398 (8 KB)Guiding lightUploaded own work with UploadWizard

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