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English: At 28 nm pitch and below, pupil fill must be restricted (to trapezoid or rectangular zones) below 20% so that after +/-18 degree rotation (slit center vs. slit edge), dipole illumination is still viable.[1]
Date
Source Own work
Author Guiding light

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References

  1. The Need for Low Pupil Fill in EUV Lithography

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16 February 2023

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current06:19, 16 February 2023Thumbnail for version as of 06:19, 16 February 20231,464 × 1,063 (185 KB)Guiding lightUploaded own work with UploadWizard

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