File:High-k.svg
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Date/Time | Thumbnail | Dimensions | User | Comment | |
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current | 18:14, 14 January 2008 | 401 × 235 (8 KB) | Stannered | {{Information |Description=Comparison of high-k dielectric structure with conventional silicon dioxide gate dielectric. Schematic is my graphical representation of an idea in the presentation by G. E. Moore, Intel Inc. |Source=en:Image:High-k.png |Da |
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