DescriptionGrid selection by Spacer patterning.png
English: This grid location selection approach is an application of crossed multiple patterning layers (US Patent 9240329). Top: Intersecting lines from spacer patterning designate locations for pattern formation at points of intersection of blue and red lines. The blue lines represent the already patterned metal lines to be cut. Bottom: An additional round of spacer patterning may select those intersection locations which will be used for pattern formation. This particular example is based on the spacer-based method of US Patent 8697538. The orange tint indicates the core features, while the green tint indicates the gap features. Diagonal selection patterns are presented in US20150179513 (patent application).
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