File:DUV vs EUV 4 masks.png
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Summary
| Description | For the given target pattern, both DUV and EUV are expected to require 4 masks. EUV's extra masks are for cutting lines to maintain sufficiently small distance between line ends.refJ. Van Schoot et al., Proc. SPIE 11147, 1114710 (2019).</ref> Since subresolution assist features (SRAFs) in the gap locations may stochastically print as dense features or defects,refP. De Bisschop and E. Hendrickx, Proc. SPIE 10957, 109570E (2019).</ref>refP. De Bisschop and E. Hendrickx, Proc. SPIE 10583, 105831K (2018).</ref> fixed pitch lines are assumed to be first EUV exposure. |
| Date | |
| Source | Excel |
| Author | Guiding light |
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| Date/Time | Dimensions | User | Comment |
|---|---|---|---|
| 2020-01-05 03:09:09 | 1493 × 668 | Guiding light | relabel DUV example |
| 2020-01-05 00:27:22 | 1512 × 668 | Guiding light | Uploading a self-made file using [[Wikipedia:File_Upload_Wizard|File Upload Wizard]] |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
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| current | 15:59, 2 April 2020 | | 1,493 × 668 (29 KB) | Hippymoose17 | Transferred from en.wikipedia (MTC!) (1.1.0) |
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