English: Characterization of self-limiting surface chemistry and digital growth in DALP. Thicknesses are determined for two distinct DALP materials by ellipsometry. a) Increase of deposit thickness with number of passes. b) Deposit line height profiles after various pass numbers, demonstrating maintained line width and edge sharpness. c) Demonstration of the self-limiting characteristic of the surface reactions by varying precursor dosage in the form of either gas flow rate or sample motion speed. d) Dependence of the growth rate (determined from a linear growth curve) on the substrate temperature, demonstrating the presence of an “ALD window”. From ref. [1]