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File:Argonne's Tribology Lab Plasma-Assisted Chemical-Vapor Deposition.jpg

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Description This commercial system was designed for the semiconductor field and contains three 8"-diameter targets that can be run individually or simultaneously to deposit metallic or dielectric film son substrates ranging up to 24" in diameter. See the entire <a href="http://www.transportation.anl.gov/facilities/tribology_tour.html">Tribology Laboratory photo tour</a>. View more about Argonne's transportation research at <a href="http://www.transportation.anl.gov">www.transportation.anl.gov</a>. Photo courtesy of <a href="http://www.anl.gov">Argonne National Laboratory</a>.
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Source Flickr: Argonne's Tribology Lab: Plasma-Assisted Chemical-Vapor Deposition
Author Argonne National Laboratory
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