File:80 nm pitch contact.jpg
No higher resolution available.
80_nm_pitch_contact.jpg (250 × 453 pixels, file size: 22 KB, MIME type: image/jpeg)
 | This is a file from the Wikimedia Commons. Information from its description page there is shown below. Commons is a freely licensed media file repository. You can help. |
Summary
| Description |
English: Top: Mask layout for 6% transmission attenuated phase-shift mask. Bottom: Corresponding top-down image at wafer level. The targeted pattern is a dense contact hole array where the feature repeats every 80 nm in x and y on the wafer. The image is formed with optimized polarized cross-pole illumination on a 193 nm immersion tool (1.3 NA). An interesting aspect of this pattern is that it has reduced sensitivity to small variations of the mask feature width. While the imaging process here benefits from reduced sensitivity to focus and mask CD error factors, the sensitivity to dose errors is very strong, due to the significant presence of unmodulated light in the background of the exposure. This prevents areas of destructive interference from being completely dark. The normalized image log-slope is equal to 1.0. |
| Date | 6 November 2007 (original upload date); 29 May 2008 (last version) |
| Source | Transferred from en.wikipedia to Commons by User:Cepheiden using CommonsHelper. |
| Author | Guiding light at en.wikipedia / Later version(s) were uploaded by Oleg Alexandrov at en.wikipedia. |
 | This image was uploaded in the JPEG format even though it consists of non-photographic data. This information could be stored more efficiently or accurately in the PNG or SVG format. If possible, please upload a PNG or SVG version of this image without compression artifacts, derived from a non-JPEG source (or with existing artifacts removed). After doing so, please tag the JPEG version with {{Superseded|NewImage.ext}} and remove this tag. This tag should not be applied to photographs or scans. If this image is a diagram or other image suitable for vectorisation, please tag this image with {{Convert to SVG}} instead of {{BadJPEG}}. If not suitable for vectorisation, use {{Convert to PNG}}. For more information, see {{BadJPEG}}. |  |
Licensing
Guiding light at en.wikipedia, the copyright holder of this work, hereby publishes it under the following licenses:
|
Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License. |
This file is licensed under the Creative Commons Attribution-Share Alike 3.0 Unported, 2.5 Generic, 2.0 Generic and 1.0 Generic license.
Attribution: Guiding light at en.wikipedia
- You are free:
- to share – to copy, distribute and transmit the work
- to remix – to adapt the work
- Under the following conditions:
- attribution – You must give appropriate credit, provide a link to the license, and indicate if changes were made. You may do so in any reasonable manner, but not in any way that suggests the licensor endorses you or your use.
- share alike – If you remix, transform, or build upon the material, you must distribute your contributions under the same or compatible license as the original.
You may select the license of your choice.
Original upload log
The original description page was here. All following user names refer to en.wikipedia.
- 2008-05-29 10:27 Guiding light 250×453× (22170 bytes)
- 2008-05-29 08:21 Guiding light 640×512× (27565 bytes) Top: Mask layout for 6% transmission attenuated phase-shift mask. Bottom: Corresponding top-down image at wafer level. The targeted pattern is a dense contact hole array where the feature repeats every 80 nm in x and y on the wafer. The image is formed wi
- 2007-11-06 04:55 Oleg Alexandrov 232×448× (29341 bytes) Crop and put images one under another to look better. Same license.
- 2007-11-06 02:25 Guiding light 640×512× (28787 bytes) Left: Mask layout for 6% transmission attenuated phase-shift mask. Right: Corresponding top-down image at wafer level. The targeted pattern is a dense contact hole array where the feature repeats every 80 nm in x and y on the wafer. The image is formed wi
File history
Click on a date/time to view the file as it appeared at that time.
| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 12:41, 12 November 2011 | | 250 × 453 (22 KB) | OgreBot | (BOT): Reverting to most recent version before archival |
| 12:41, 12 November 2011 |  | 640 × 512 (27 KB) | OgreBot | (BOT): Uploading old version of file from en.wikipedia; originally uploaded on 2008-05-29 08:21:05 by Guiding light | |
| 12:41, 12 November 2011 |  | 232 × 448 (29 KB) | OgreBot | (BOT): Uploading old version of file from en.wikipedia; originally uploaded on 2007-11-06 04:55:56 by Oleg Alexandrov | |
| 12:41, 12 November 2011 |  | 640 × 512 (28 KB) | OgreBot | (BOT): Uploading old version of file from en.wikipedia; originally uploaded on 2007-11-06 02:25:50 by Guiding light | |
| 15:19, 9 November 2011 |  | 250 × 453 (22 KB) | File Upload Bot (Magnus Manske) | {{BotMoveToCommons|en.wikipedia|year={{subst:CURRENTYEAR}}|month={{subst:CURRENTMONTHNAME}}|day={{subst:CURRENTDAY}}}} {{Information |Description={{en|Top: Mask layout for 6% transmission attenuated phase-shift mask. Bottom: Corresponding top-down image |
File usage
No pages on the English Wikipedia use this file (pages on other projects are not listed).
